Blistering of potassium-tantalate single crystals induced by helium implantation

Potassium-tantalate crystals were implanted with helium ions at 190 keV and then thermally treated at different temperatures to study their blistering. The surface blistering, hydrogen depth distribution, and lattice damage induced by He+ implantation were characterized using secondary ion mass spectroscopy, optical and transmission electron microscopy, and Rutherford backscattering spectrometry. The blistering of potassium-tantalate crystals was achieved at certain ion fluences followed by thermal treatment.