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Electrical properties of HfO 2 charge trap flash memory with SiO 2/HfO 2/Al 2O 3 engineered tunnel layer
Electrical properties of HfO 2 charge trap flash memory with SiO 2/HfO 2/Al 2O 3 engineered tunnel layer
2010
Se-Man Oh
Hee-Wook You
Kwan-Su Kim
Young-Hie Lee
Won Ju Cho
Keywords:
Non-volatile memory
Analytical chemistry
Atomic physics
Work function
Chemistry
Charge trap flash
Flash memory
Optoelectronics
Materials science
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