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Interface of tantalum oxide films on silicon by UV annealing at low temperature
Interface of tantalum oxide films on silicon by UV annealing at low temperature
2002
Q. Fang
J.-Y. Zhang
Zhongping Wang
J.X. Wu
B.J. O'Sullivan
Paul K. Hurley
T.L. Leedham
M. Audier
J.P. Senateur
Ian W. Boyd
Keywords:
Optoelectronics
World Wide Web
Annealing (metallurgy)
Tantalum oxide
Computer science
Silicon
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