Metamorphic growth of 1.55 μm InGaAs/InGaAsP multiple quantum wells laser structures on GaAs substrates

We fabricate a Ga As-based In Ga As/In Ga As P multiple quantum wells(MQWs) laser at 1.55 μm. Using two-step growth method and thermal cyclic annealing, a thin low-temperature In P layer and a thick In P buffer layer are grown on Ga As substrates by low-pressure metal organic chemical vapor deposition technology. Then, highquality MQWs laser structures are grown on the In P buffer layer. Under quasi-continuous wave(QCW) condition, a threshold current of 476 m A and slope efficiency of 0.15 m W/m A are achieved for a broad area device with 50 μm wide strip and 500 μm long cavity at room-temperature. The peak wavelength of emission spectrum is1549.5 nm at 700 m A. The device is operating for more than 2000 h at room-temperature and 600 mA.