Curable resin composition for nanoimprint

PROBLEM TO BE SOLVED: To provide a resin composition for nano-imprints stably forming fine patterns efficiently in high precision, and a cured product thereof. SOLUTION: This photo-curable resin composition for nano-imprints comprises a combination of a cationically polymerizable compound and a radically polymerizable compound, or a heterolytically polymerizable compound having both cationic polymerizability and radical polymerizability. As the cationically polymerizable compound, for example, a cyclic ether compound, a vinyl ether compound, a polycarbonate-based compound and the like can be utilized. The method for producing the fine structural matter comprises preferably: (1) a process of forming a film comprising this resin composition on a support, (2) a process of transcribing patterns on the film by using a nano-stamper, and (3) a process of curing the film with transcribed patterns to obtain the fine structural matter. COPYRIGHT: (C)2009,JPO&INPIT