Real time, in situ particle monitoring of the Applied Materials PI9200 ion implanter

Abstract Real time monitoring of particles in the process chamber and the roughing line of high current implanters has recently been of invaluable assistance to equipment manufacturers and fabrication Une process engineers. Earlier in situ particle monitors were limited in their performance by the size (>0.5 μm), velocity ( 0.22 μm, installed in a PI9200 ion implanter are discussed here. It is demonstrated that an equipment engineer can study, test, and improve autoclean cycles with the effect of any hardware change. The development of SPC charts and possible processing interlocks are discussed.