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New Resist Technologies for $\bf 0.25\mbox{-}\mbi{\mu}{\bf m}$ Wiring Pattern Fabrication with KrF Lithography
New Resist Technologies for $\bf 0.25\mbox{-}\mbi{\mu}{\bf m}$ Wiring Pattern Fabrication with KrF Lithography
1997
Yoshio Kawai
Akihiro Otaka
Akinobu Tanaka
Jiro Nakamura
Kazuhito Sakuma
Tadahito Matsuda
Yutaka Sakakibara
Keywords:
Nanotechnology
Physics
Lithography
Resist
Correction
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