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Plasma Enhanced Atomic Layer Deposited Ru for MIMCAP Applications
Plasma Enhanced Atomic Layer Deposited Ru for MIMCAP Applications
2011
Johan Swerts
M.M. Salimullah
M. Popovici
Min-Soo Kim
M. A. Pawlak
Annelies Delabie
M. Schaekers
Kazuyuki Tomida
B. Kaczer
Karl Opsomer
C. Vrancken
I. Debusschere
L. Altimime
Jorge Kittl
S. Van Elshocht
Keywords:
Radiochemistry
Plasma
Materials science
Analytical chemistry
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