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Optical Etch‐Rate Monitoring: Computer Simulation of Reflectance
Optical Etch‐Rate Monitoring: Computer Simulation of Reflectance
1984
P. A. Heimann
R. J. Schutz
Keywords:
Analytical chemistry
Thin film
Isotropic etching
Reflectivity
Chemistry
Inorganic chemistry
Aluminium
Silicon
Process control
multiple layer
optical reflection
Optics
Correction
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