Subwavelength diffractive elements fabricated in semiconductor for 975 nm

This paper presents a high-efficiency, dielectric, subwavelength surface relief ``blazed grating`` and reports recent results on a subwavelength ``anti-reflection`` surface. These structures were designed for use at 975 nm, probably the shortest wavelength for which semiconductor structures of these types have been successfully demonstrated. They were fabricated in GaAs substrates.