Optical and transport properties of LaTi{sub 1−x}M{sub x}(O,N){sub 3±δ} (x=0; 0.1, M=Nb{sup 5+}, W{sup 6+}) thin films prepared by plasma ammonolysis

Oxynitride thin films of composition LaTi{sub 1−x}M{sub x}(O,N){sub 3±δ} with x=0; 0.1 and M=Nb{sup 5+}, W{sup 6+} were prepared by nitridation via microwave-induced plasma (MIP) ammonolysis, which allowed keeping the nitridation time short (16 min). The higher possible oxidation states of the B-site substituents (Nb{sup 5+}, W{sup 6+}) with respect to Ti{sup 4+} caused higher N content for LaTi{sub 0.9}Nb{sub 0.1}(O,N){sub 3±δ} and LaTi{sub 0.9}W{sub 0.1}(O,N){sub 3±δ} compared to LaTiO{sub 2}N due to charge-compensation. XPS O 1s and N 1s core level and valence band spectra evidenced for increasing N content in the order LaTiO{sub 2}N