High-speed ablation processes with nanosecond and picosecond lasers

When laser radiation is absorbed on the interface between a substrate and a coating, pressure of the vaporized material can blast off the coating. Quality of this process depends on the ratio of vapor to melt creation and is improved with shorter pulse width and high intensity.On multi layer systems the absorption of the different layers must be taken account of. This is demonstrated for an amorphous silicon solar cell.Paint stripping is another application that can be improved by vapor pressure induces ablation using short pulsed lasers.Pulse widths of only a few picoseconds allow melt free ablation.When laser radiation is absorbed on the interface between a substrate and a coating, pressure of the vaporized material can blast off the coating. Quality of this process depends on the ratio of vapor to melt creation and is improved with shorter pulse width and high intensity.On multi layer systems the absorption of the different layers must be taken account of. This is demonstrated for an amorphous silicon solar cell.Paint stripping is another application that can be improved by vapor pressure induces ablation using short pulsed lasers.Pulse widths of only a few picoseconds allow melt free ablation.