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Barrier process development for damascene integration of porous SiLK resin films
Barrier process development for damascene integration of porous SiLK resin films
2001
Zsolt Tokei
Joost Waeterloos
Francesca Iacopi
Rudy Caluwaerts
Herbert Struyf
Joke Van Aelst
Karen Maex
Keywords:
Copper interconnect
Porosity
Materials science
Composite material
SILK
process development
Correction
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