Direct growth of vertical structure MoS2 nanosheets array film via CVD method for photodetection

Abstract The vertical structure MoS 2 nanosheets array thin film for sensitive photodetection was fabricated on TiO 2 buffer layer substrate by chemical vapor deposition (CVD) method for the first time. Discussion on the growth mechanism reveals the important roles of TiO 2 buffer layer in the vertical direction growth. Vertical structure MoS 2 nanosheets array film based photodetector presents a high sensitivity for 532 nm light, and exhibits a fast response time and a high detectivity of D* ≈ 3.325 × 10 11  cm Hz 1/2 /W. This work shows that the distinctive advantages of vertical structure MoS 2 for sensitive photoelectric detection.