A method of manufacturing an array substrate, goa unit and a display device

Example embodiments provide an array substrate and a manufacturing method of the present invention, the GOA unit and a display device, it relates to the field of display technology. The array substrate includes a gate electrode formed on the surface of the substrate, a gate insulating layer, an active layer and source-drain metal layer, the source-drain metal layer for forming the source drain and channel region of the TFT, the array substrate includes a plurality of a first plurality of the second TFT and a TFT, the TFT channel length of the first region is less than the length of the second TFT channel region. Such a failure can be avoided array substrate breaking unit GOA TFT channel region caused disconnected.