Old Web
English
Sign In
Acemap
>
Paper
>
Inherently Area-Selective Atomic Layer Deposition of SiO2 Thin Films to Confer Oxide Versus Nitride Selectivity
Inherently Area-Selective Atomic Layer Deposition of SiO2 Thin Films to Confer Oxide Versus Nitride Selectivity
2021
Jinseon Lee
Jeong-Min Lee
Hongjun Oh
Changhan Kim
Jiseong Kim
Daehyun Kim
Bonggeun Shong
Tae Joo Park
Woo-Hee Kim
Keywords:
Chemical engineering
Selectivity
Atomic layer deposition
Thin film
Density functional theory
Materials science
Oxide
Nitride
Correction
Source
Cite
Save
Machine Reading By IdeaReader
43
References
0
Citations
NaN
KQI
[]