The resist pattern forming method

Object of the present invention is to provide: a fluorine-containing polymer which comprises a step using a photoresist film photoresist-forming radiation-sensitive resin composition of the additive: a resist pattern forming method, comprising the steps of , the fluoropolymer weight determined using gel permeation chromatography-average molecular weight of 1,000 to 50,000, the receding contact angle with water when forming the photoresist film is less than 70 degrees; refraction at a wavelength of 193nm It is larger than the refractive index of air ratio of the liquid immersion exposure step between the lens and the photoresist film and subjected to irradiation with liquid interposed; and a step of coating a photoresist film now exposed above.