Advances in the process and in the methodology of emulsion optical masks construction

This work presents the optical mask laboratory available at the Centro de Componentes Semicondutores - CCS/Unicamp. Micropattems of 5 μm, typical dimensions for MEMs devices, for example, has been obtained by photoreduction and photorepetition processes. In these processes a pattern is optically transferred with a reduction of 10x from a photolith to a photographic emulsion on a glass substrate and then reduced by 5x and repeated. Under some limitations, optical masks can replace conventional electron beam or pattern generator masks with low cost, time and high reproducibility. Also, it is shown the methodology developed for these processes.