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Measurements of Pitch, Height, and Width Artifacts with the NIST Calibrated Atomic Force Microscope
Measurements of Pitch, Height, and Width Artifacts with the NIST Calibrated Atomic Force Microscope
1998
Ronald G. Dixson
V W. Tsai
Theodore V. Vorburger
Edwin R. Williams
X.-S. Wang
Joseph Fu
R Koning
Keywords:
Metrology
NIST
Atomic force microscopy
Materials science
Laser linewidth
Optics
Analytical chemistry
step height
Correction
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