Old Web
English
Sign In
Acemap
>
Paper
>
Investigation of non-charging exposure conditions for insulating resist films in electron beam lithography
Investigation of non-charging exposure conditions for insulating resist films in electron beam lithography
2021
Kento Kubo
Kentaro Kojima
Yoshinobu Kono
Masatoshi Kotera
Keywords:
Electron-beam lithography
Resist
Materials science
Optoelectronics
Correction
Source
Cite
Save
Machine Reading By IdeaReader
27
References
0
Citations
NaN
KQI
[]