The significance of self-annealing at room temperature in high purity copper processed by high-pressure torsion

Abstract High purity copper was processed by high-pressure torsion (HPT) at room temperature and then stored at room temperature for periods of up to 6 weeks to investigate the effect of self-annealing. Hardness measurements were recorded both at 48 h after HPT processing and after various storage times. The results show the occurrence of recovery near the edges of the discs after processing through 1/2 and 1 turn and this leads to a significant drop in the measured hardness values which is accompanied by microstructural evidence for abnormal grain growth. Conversely, there was no recovery, and therefore no hardness drops, after processing through 5 and 10 turns. X-ray line profile analysis was used to determine the crystallite sizes and dislocation densities at 1 h after HPT and after storage for different times. The results show a good thermal stability in high purity Cu after processing through more than 1 turn of HPT but care must be exercised in recording hardness measurements when processing through only fractional or very small numbers of turns.