Structural and magnetoresistive properties of electrodeposited thin films for magnetic sensors applications

In this work, an attempt has been made to investigate the magnetic behavior of CoNiW thin film on different conducting substrates in room temperature using electrodeposition technique. From the investigation the operational parameters such as pH value of 6, current density of 10 mA/cm2 and deposition time of 30 min has been found as optimum for preparing CoNiW thin films on both substrates. Hence the characteristics of the CoNiW films prepared at these optimum deposition parameters have been reported. The X-ray diffractogram revealed crystallinity and nano deposits in the film. FE-SEM micrographs and EDAX pattern confirms the morphology and constituents in the film. From the hysteresis loop the soft ferromagnetic nature of the film has been confirmed on both the substrates. The coercivity of the film was found as 2942 and 2002 Oe for copper and stainless steel substrates respectively. The Magnetoresistive ratio of the films is found to be decreased with respect to the applied magnetic field. The films deposited on copper substrates has shown a better magnetoresistive behavior (45–10%) compared to the films deposited on stainless steel substrate and is suitable for magnetic sensors and magnetic devices.