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Advanced photomask fabrication by e-beam lithography for mask aligner applications
Advanced photomask fabrication by e-beam lithography for mask aligner applications
2016
Tina Weichelt
Yannick Bourgin
M. Banasch
U. D. Zeitner
Keywords:
Electronic engineering
Electron-beam lithography
Photolithography
Maskless lithography
Mask set
Photomask
Materials science
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