Compact electron cyclotron resonance plasma source for molecular beam epitaxy applications

We describe a compact, versatile electron cyclotron resonance (ECR) nitrogen plasma source specially designed to be mounted on a 35 conflat flange. The operation frequency is 2.45 GHz. The magnetic field is produced by permanent magnets. In order to eliminate ions in the plasma stream, a nonaxial geometry of the magnetic field was chosen. Two applications are discussed, namely, the p‐type doping of II–VI tellurides and the growth of III–V nitrides. In both cases, use of the ECR plasma source results in high quality material.