A Model for the Etching of Ti and Tin in SC-1 Solutions
1997
The Standard Clean 1 (SC-1), developed by W. Kern and D. Puotinen in 1965
and disclosed in 1970 [1], consists of a mixture of ammonium-hydroxide,
hydrogen-peroxide, and water. (SC-1 is also called the Airfmonium-Hydroxide
Peroxide Mixture or APM). Originally, this chemical mixture was developed
for cleaning silicon wafers and it has proven to be the most efficient
particle removing agent found to date. SC-1 can, however, also be used for
etching. SC-1 will etch the following materials: SiO 2 ,
Si 3 N 4 , Si, Ti and TiN. On top of this, SC-1 will
grow an oxide on several materials (i.e., bare silicon). In this paper, a quantitative model for the SC-1 solution is presented. The
etching of Ti and TiN is shown to be fundamentally different from the
etching of SiO 2 . The mixture of Ammonium-hydroxide and Hydrogen
Peroxide must be optimized differently for Ti and TiN etching than for the
particle removal from Silicon wafers.
Keywords:
- Correction
- Source
- Cite
- Save
- Machine Reading By IdeaReader
1
References
10
Citations
NaN
KQI