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Barrier Metal Slurry for Low Defect Copper Damascene Chemical Mechanical Polishing
Barrier Metal Slurry for Low Defect Copper Damascene Chemical Mechanical Polishing
2015
Hojoong Kim
Kyewon Seo
Jinok Moon
Hyunsoo Kim
Hasub Hwang
Keywords:
Copper interconnect
Copper
Metallurgy
Chemical-mechanical planarization
Slurry
Metal
Chemistry
copper damascene
Correction
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