A Thermodynamic Model for the Hydrogen Incorporation in PECVD Silicon Oxynitrides Thin Layers

In the PECVD SixNyHzOw the hydrogen is principally incorporated as N-H bonds. For O/(O+N) below 0.4, the %H is constant at 25%; from 0.4 to 1, it decreases to 4%. We show that a chemical ordered model is likely to describe the hydrogen incorporation in the amorphous network while a random bond model fails.