Ion-beam modification of magnetism in thin films and multilayers

Abstract The interfaces’ structure and chemical roughness play an important role on the magnetic properties of thin-film multilayer devices. Within the past two decades, there has been a surge of interest in the use of low-dose ion-beam irradiation to engineer topology of buried interfaces, without changing the morphology, and to control magnetic properties of multilayer heterostructures consequently. This interest has recently been stimulated by promising results in the emerging sub-field of spin-orbitronics. In this chapter, the possible applications of ion-beam irradiation towards the modification of different magnetic properties of thin-film heterostructures are explored.