Cvd device for highly efficient and highly uniform attachment

PURPOSE: To provide an injector, which is used in CVD and LPCV devices and improves the uniformity of a film attached on the entire surface of a single wafer. CONSTITUTION: A convex-wall surface 31 facing a susceptor 14 sends a vapor to the wafer which is supported with the susceptor. Laminar flow is generally formed along the entire surface of the wafer. This laminar flow prevents the formation of a recirculation in the region between the wafer and an injector 12, together with a convex side surface. COPYRIGHT: (C)1993,JPO