Investigations of ammonium sulfide surface treatments on GaAs

X‐ray photoelectron spectroscopy (XPS) and reflection high‐energy electron diffraction (RHEED) results are presented for ammonium sulfide treated (100)GaAs surfaces. XPS shows that the sulfur coverage is independent of the ammonium sulfide concentration, although the relative amount of arsenic decreases as the sulfide concentration increases. RHEED patterns show that higher temperatures are required for the surface to restructure following treatment with higher sulfide concentration. In addition to the order of magnitude changes in the diode saturation current densities following ammonium sulfide treatment, we observe that the characteristics of gold and aluminum Schottky barriers on sulfide‐treated GaAs surfaces also vary with the substrate temperature during metal deposition.