High-resolution transmission and scanning electron microscopy of boride-nitride nanostructured films

The results of electron-microscopic studies of grain boundaries and the structure of fractures of titanium boride-and nitride-based films obtained by nonreactive magnetron sputtering are considered. The chemical and phase composition of the films is analyzed with the help of Auger electron spectroscopy and microscopic electron diffraction analysis. The structure of boundaries and the presence of amorphous inclusions, dislocations, and other structural distortions are discussed and the nature of the deformation under indentation is considered.