Perovskite Pattern Formation by Chemical Vapor DepositionUsing Photolithographically Defined Templates

Thin film fabrication is necessary to realize the device integration of organic–inorganic hybrid perovskites (OIHPs), and solution-based crystallization methods have been employed widely to this end. Despite the versatility of the solution approach, device fabrication using typical “top-down” lithography is generally incompatible with as-prepared OIHPs films because of the low stability of perovskites to polar solvents involved in the lithographic process. Moreover, solution-prepared perovskites usually exhibit irregular surface roughness, implying the existence of randomly oriented crystal domains with a large density of grain boundaries, which are ultimately detrimental to the material properties. Here, we report a patterning of CH3NH3PbI3 (MAPbI3) thin films using a photolithographically fabricated cross-linked copolymer template on Si or SiO2 substrates via a chemical vapor deposition (CVD) method. Perovskite patterning is accomplished by growing PbI2 precursor layers selectively on template patterns ...