Improvements of plasma immersion ion implantation (PIII) and deposition (PIII&D) processing for materials surface modification

Abstract Plasma immersion ion implantation (PIII) process is a three dimensional surface modification method that is quite mature and well known to the surface engineering community nowadays, especially to those working in the field of plasma–materials interaction, aiming at both industrial and academic applications. More recently, deposition methods have been added to PIII, the PIIID 2 — nanostructures in ZnO films, obtained by PIIID 3 — combined implantation and deposition of calcium for biomaterial activity of Ti alloy (PIIID 4 — magnetron sputtering deposition of Cr that was enhanced by the glow discharge Ar plasma to allow implantation and deposition of Cr on SAE 1070 steel (PIIID and 5 — implantation of nitrogen by ordinary PIII into this Cr film, which improved resistance to corrosion, while keeping the tribological properties as good as for the SAE 1070 steel surface.