Addendum: New model of electron free path in multiple layers for Monte Carlo simulation

In this note, it is shown that the previous Monte Carlo simulations of energy dissipation in polymer films by electron beam scattering [R. J. Hawryluk, A. M. Hawryluk, and H. I. Smith, J. Appl. Phys. 45, 2551 (1974)] are consistent with the recent calculation of S. Horiguchi et al. [Appl. Phys. Lett. 15, 512 (1981)]. Such Monte Carlo simulations have been widely used in electron beam lithography.