Plasma generating apparatus, the plasma processing apparatus, a plasma generating method and a plasma processing method

To provide a plasma generating apparatus which can eliminate substantially that member material of the electrode or the like existing around the plasma excitation region is sputtered by accelerated electrons. And the main surface (10a) and rear (10b) electrodes (10) for plasma formation with high-frequency supply portion (100,70,60) to the electrode (10) over the high-frequency power 200MHz frequency, electrode (10) provided on the back side of, including a first fixed magnet (56) and the S second fixed magnet poles are opposed to the back (58) and the N poles are opposed to the rear, includes a magnetic field forming mechanism for forming a loop-shaped magnetic field region LMR for confining the excited plasma in the vicinity of the main surface (10a) (50), a loop-shaped magnetic field region for forming the magnetic field forming mechanism (50) LMR has a 3000 gauss or more strong magnetic field in a direction parallel to the main surface (10a).