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Double Exposure Laser Interference Lithography for Pattern Diversity using Ultraviolet Continuous-Wave Laser
Double Exposure Laser Interference Lithography for Pattern Diversity using Ultraviolet Continuous-Wave Laser
2019
Yong-Won Ma
Jun-Han Park
Dan Hee Yun
Cheong-Yeol Gwak
Bo Sung Shin
Keywords:
Optics
laser interference lithography
Ultraviolet
Gaussian beam
Continuous wave
Multiple exposure
Materials science
Correction
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