Azide complexes as forerunners for metallic thin films on Si surfaces

Abstract The deposition of films of metals, metal oxides and metal nitrides on surfaces has attracted a great deal of interest due to their importance in the semiconductor industry. An alternative method, which totally avoids the resist technology, is to use the photodecomposition of azide complexes layers. We have initiated a study about photodecomposition of new compounds [Cr(N 3 )L(H 2 O) 2 ](NO 3 ) 2 , [Ni(N 3 ) 2 L 2 ]·10H 2 O, [CuN 3 L](NO 3 ) (L=triethanolamine) and [Cr(N 3 )L′(H 2 O) 4 ](NO 3 ) 2 , [Cu(N 3 )L′(H 2 O) 2 ](NO 3 ) (L′=diethanolamine) comparatively with [Cr(NH 3 ) 5 N 3 ] 2+ , [Ni(NH 3 ) 5 N 3 ] + and [Cu(NH 3 ) 3 N 3 ] + . We have selected the best wavelengths for each of the complexes after a detailed study of UV-spectra.