Immersion-cluster uptime enhancement technology toward high-volume manufacturing
2009
In immersion lithography, importance is placed on technology for controlling coating along the edge of the wafer. In the
case of a top-coat process, it has been observed that the top coat can peel off during immersion exposure due to weak
adhesion to the substrate, a characteristic of top-coat films. The peeling of the film is thought to adversely affect
immersion-exposure equipment and the wafer surface by the formation of defects due to the contamination of the
immersion-exposure tool and by residual particles. Nikon Corporation and Tokyo Electron Ltd. (TEL) have performed
joint research and development in response to these problems. TEL has studied rinsing technology for the wafer edge
section and established coating processes and control techniques that rinse the edge section to remove foreign matter and
that control the cutting position of each film in the edge section. TEL has developed new processes and hardware to
remove foreign matter introduced into the immersion-exposure tool, and has shown that this technology can help prevent
contamination of exposure equipment. Nikon has established efficient on-body periodic rinsing as a new technology for
exposure equipment that can reduce defect.
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