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Nanotrenches: An Optical Lithography Process for High- Aspect- Ratio sub- 100 nm Gaps
Nanotrenches: An Optical Lithography Process for High- Aspect- Ratio sub- 100 nm Gaps
2012
Jean-Francois Dayen
Vina Faramarzi
Bernard Doudin
Keywords:
Photolithography
Aspect ratio (aeronautics)
Optics
Next-generation lithography
Materials science
Optoelectronics
Correction
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