The development of electron beam absorbed current imaging system using scanning transmission electron microscope and its application

To realize higher spatial resolution than conventional SEM-based nano-probing system, a novel Electron Beam Absorbed Current imaging system was newly developed using a Hitachi HD-2700 200 kV dedicated STEM. Its specimen holder accommodates a mechanical probe for current detection and TEM grid specimen. This holder also has a micrometer-based coarse positioning and piezoelectric-elements-based fine positioning mechanism respectively for X, Y and Z-axis probe control. The absorbed current from the probe and the specimen are displayed as an image by STEM software via EBAC amplifier. We successfully made a probing onto FIB-prepared lamella specimen of semiconductor device to get an electrical contact. EBAC and EBIC images were clearly visualized in higher spatial resolution.