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Toward scalable spin qubits: Si/SiGe quantum dot devices built on a 300mm process line
Toward scalable spin qubits: Si/SiGe quantum dot devices built on a 300mm process line
2021
Brennen Mueller
Stephanie A. Bojarski
George Hubert C
Eric Henry
Otto Zietz
Samuel F. Neyens
T. F. Watson
Rambert Nahm
Payam Amin
Caudillo Roman
Ravi Pillarisetty
Roza Kotlyar
Lampert Lester
F. Luthi
Torres Jessica M
Jeanette M. Roberts
James S. Clarke
Keywords:
Quantum dot
Optoelectronics
Qubit
Spin-½
Physics
process line
Scalability
Correction
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