Towards 233U recoil ion sources providing 229Th ions with minimum energy spread

Four different techniques were applied for the production of 233U alpha recoil ion sources, providing 229Th ions. They were compared with respect to a minimum energy spread of the 229Th recoil ions, using the emitted alpha particles as an indicator. The techniques of Molecular Plating, Drop-on-Demand inkjet printing, chelation from dilute nitric acid solution on chemically functionalized silicon surfaces, and self-adsorption on passivated titanium surfaces were used. All fabricated sources were characterized by using alpha spectrometry, radiographic imaging, and scanning electron microscopy. The complexation and the self-adsorption based approaches are most promising for the preparation of recoil ion sources delivering monochromatic recoil ions.