Kirkendall voids and the formation of amorphous phase in the Al‐Pt thin‐film system prepared by high‐temperature successive deposition

We report on the amorphization processes taking place in the Al‐Pt thin‐film system prepared by high‐temperature successive deposition. The formation of Kirkendall voids in the Al film was directly proved and intensively studied in relation to the percentage of Al and Pt components. An estimation of the composition of the amorphous phase is given, and the model proposed for the amorphization process is discussed. The films were analyzed by transmission electron microscopy, cross‐sectional transmission electron microscopy, selected area electron diffraction, and energy dispersive x‐ray microanalysis.