Substrate treating method
2003
The present invention provides a method for processing a substrate, comprising: a first step of processing a first substrate to be processed in the processing vessel; the second step of the substrate to be processed is unloaded from the processing vessel; for the treatment a third step of removing the oxygen vessel treatment; loaded substrate to be processed to the processing of the fourth step of the container; and a fifth step of processing the second substrate to be processed.
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