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Process Window Centering for 22 nm lithography
Process Window Centering for 22 nm lithography
2010
Buengener
Boyé
Rhoads
Chong
Tejwani
Burns
Stamper
NafisI
Brodsky
Fan
Kini
Hahn
Keywords:
Optoelectronics
random defects
Lithography
Process window
Modulation
Resist
Finite element method
Materials science
Correction
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