An optical member for an exposure apparatus and an exposure apparatus

A plurality of optical members 2,4a, 4b, there is provided an exposure apparatus for exposing exposure object 15 by irradiating the pulse light by transmitting 300nm wavelengths below a 6,7,9,12, multiple optical members 2,4a, 4b, consists of at least one synthetic silica glass member of 6,7,9,12, and the thickness of the synthetic quartz glass member, and the energy density per pulse of the pulsed light, and the pulse width,