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Ultrahigh- χ Block Copolymer Materials with Versatile Etch Selectivity for Sub-10 nm Pattern Transfer
Ultrahigh- χ Block Copolymer Materials with Versatile Etch Selectivity for Sub-10 nm Pattern Transfer
2021
Jian Sun
Koei Azuma
Youngwoo Choo
Changyeon Lee
Jonathan H. Dwyer
Yekaterina Rokhlenko
Teruaki Hayakawa
Chinedum O. Osuji
Padma Gopalan
Keywords:
Chemical engineering
Materials science
Copolymer
Selectivity
Correction
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