Fabrication of Highly Metallic TiN Films by Pulsed Laser Deposition Method for Plasmonic Applications

We report the fabrication of titanium nitride (TiN) films with the “best” plasmonic behavior reported so far by the pulsed laser deposition method. Even though the deposition is done at room temperature (∼25 °C) and grown on an amorphous native oxide of a silicon wafer, the plasmonic property of the TiN is comparable to that of gold, which is a conventional plasmonic material in the visible to near-infrared region. Because of the highly plasmonic nature of the TiN, the near field around the TiN nanostructure can be as high as that of a gold nanostructure. A room-temperature process without a strict requirement on the substrate allows depositing a TiN film even on a flexible polymer film without degrading its property. Our results pave the way for using TiN as a truly practical plasmonic material, replacing the use of noble metals.