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Fabrication of ultra shallow junction formation using plasma doping and excimer laser annealing for nMOSFET
Fabrication of ultra shallow junction formation using plasma doping and excimer laser annealing for nMOSFET
2009
Lak-myung Jung
Seung-Woo Do
Jae-Min Kim
Seong Ho Kong
Ki Hong Nam
Yong Hyun Lee
Keywords:
Plasma
Excimer laser
Annealing (metallurgy)
Doping
Analytical chemistry
Electronic engineering
Materials science
excimer laser annealing
shallow junction
Fabrication
Optoelectronics
Correction
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