Design and Analysis of a Laser Lift-Off System using an Excimer Laser
2013
Laser Lift-Off (LLO) is a process that removes a GaN or AIN thin layer from a sapphire wafer to manufacture vertical-type LEDs. It consists of a light source, an attenuator, a mask, a projection lens and a beam homogenizer. In this paper, we design an attenuator and a projection lens. We use the ‘ZEMAX’ optical design software for analysis of depth of focus and for a projection lens design which makes 7×7 mm
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